LINTEC and AIST develop CNT pellicles with 66x durability boost for EUV lithography
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barbaradellaporta
Summary
LINTEC, in joint research with AIST's Semiconductor Frontier Research Center, has developed a new carbon nanotube (CNT) pellicle technology for extreme ultraviolet (EUV) lithography. The breakthrough addresses the longstanding challenge of balancing durability with light transmittance, achieving up to 66 times greater durability while maintaining sufficient transmittance for semiconductor manufacturing. This advancement is significant for the future of EUV lithography, a critical process in producing advanced microchips.
Source
bskyLINTEC and AIST develop CNT pellicles with 66x durability boost for EUV lithographyeetimes.comKey quotes
· 3 pulledA significant step towards solving the biggest challenge
the biggest challenge has been balancing durability with light transmittance capabilities
LINTEC announced the successful development of new technology, marking a major step forward in resolving this issue
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