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First reported by GuruFocus
ASML (ASML) and Intel (INTC) Announce Use of High NA EUV Lithography for Ultra 3 Processors

Intel Puts High NA EUV Into Volume Production First — and Panther Lake Is the Proof

ASML says High NA EUV is now patterning select Intel 18A layers in Oregon — at yields matching the tools it’s meant to succeed. Intel The post Intel Puts High NA EUV Into Volume Production First —…

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crmaris15h agoen

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