Reactor-Scale Boron Nitride Photocatalysis Shows Promise for PFAS Degradation in Semiconductor Wastewater
By
Michael S. Wong
Summary
This article discusses a research study on using boron nitride (BN) photocatalysis at reactor scale for degrading PFAS (per- and polyfluoroalkyl substances) in semiconductor fabrication wastewater. It highlights the growing regulatory pressure from the EPA and EU on PFAS limits in water, and presents BN photocatalysis as a promising energy-efficient technology for PFAS defluorination. The study focuses on reactor-scale performance of VUV/UVC boron nitride photocatalysis, which has not been previously reported, addressing a critical gap in scaling up this treatment technology for industrial wastewater applications.
Source
Twitter / XReactor-Scale Boron Nitride Photocatalysis Shows Promise for PFAS Degradation in Semiconductor Wastewatergo.acs.orgKey quotes
· 3 pulledThe U.S. Environmental Protection Agency (EPA) has set strict limits for perfluorooctanoic acid (PFOA) and perfluorooctanesulfonic acid (PFOS) in drinking water at 4 ng/L.
As regulatory pressure continues to grow both in the U.S. and globally, industries that discharge PFAS-containing wastewater face increased scrutiny.
Boron nitride (BN) is a commercially available photocatalyst with demonstrated activity for degrading per- and polyfluoroalkyl substances (PFAS), but reactor-scale performance has not been reported.
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